Interferometer and method for measuring characteristics of optically unresolved surface features
US7324214B2 · kind B2 · utility
61Cited by
35References
56Claims
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Key dates
| Filing date | Sep 21, 2006 |
| Grant date | Jan 29, 2008 |
| Priority date | — |
| Expiry date | Sep 21, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2290/70
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed is an interferometry analysis method that includes comparing information derivable from multiple interferometry signals corresponding to different surface locations of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parameterized by a series of characteristics that relate to one or more under-resolved lateral features of the test object; and outputting information about the under-resolved surface feature based on the comparison.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.