Patterned atomic layer epitaxy

US7326293B2 · kind B2 · utility

Assignee

• ZYVEX LABS, LLC · US

Inventors

• John N. Randall · Richardson, US
• Jingping Peng · Plano, US
• Jun-Fu Liu · Newmarket, US
• George D. Skidmore · Richardson, US
• Christof Baur · Darmstadt, DE
• Richard Stallcup · Frisco, US
• Robert Folaron · Plano, US

Key dates

• Filing date: Mar 25, 2005
• Grant date: Feb 5, 2008
• Expiry date: Dec 2, 2025

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C30B25/04
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A patterned layer is formed by removing nanoscale passivating particle from a first plurality of nanoscale structural particles or by adding nanoscale passivating particles to the first plurality of nanoscale structural particles. Each of a second plurality of nanoscale structural particles is deposited on each of corresponding ones of the first plurality of nanoscale structural particles that is not passivated by one of the plurality of nanoscale passivating particles.