Antireflective composition and process of making a lithographic structure
US7326442B2 · kind B2 · utility
7Cited by
14References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 14, 2005 |
| Grant date | Feb 5, 2008 |
| Priority date | — |
| Expiry date | Feb 28, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antireflective composition and a lithographic structure comprising a silicon-metal oxide, antireflective material derived from the composition. The antireflective composition comprises a polymer of formula I,
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.