Cast pedestal with heating element and coaxial heat exchanger
US7327948B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 18, 2005 |
| Grant date | Feb 5, 2008 |
| Priority date | — |
| Expiry date | Dec 27, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides a heat transfer assembly that, when coupled to an object, is capable of keeping the object at a uniform elevated temperature while removing large amounts of heat from an external source. The assembly may be contained in a pedestal for use in a UV-cure chamber. The heat transfer assembly includes a heating element to control the wafer temperature and a cooling element to remove incident IR heat from the wafer and pedestal. A heat resistant layer having a calibrated heat resistance is located between the heating and cooling elements and between the wafer and the cooling elements. The heat resistant layer is able to sustain high temperature gradient from the wafer to the coolant so that the coolant does not boil while permitting enough heat to be conducted away from the wafer to maintain the desired set-point temperature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.