Inductively coupled plasma processing apparatus having internal linear antenna for large area processing
US7338577B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 15, 2003 |
| Grant date | Mar 4, 2008 |
| Priority date | — |
| Expiry date | May 15, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An inductively coupled plasma processing apparatus for a large area processing, the inductively coupled plasma processing apparatus comprising: a reaction chamber; a plurality of linear antennas horizontally arranged at an inner upper portion of the reaction chamber while being spaced from each other by a predetermined distance for receiving induced RF power, the linear antennas being coupled to each other at an outer portion of the reaction chamber, the linear antennas including at least one bending antenna formed by connecting first ends of adjacent antennas, which are exposed to the outer portion of the reaction chamber, to each other; and at least one magnet positioned adjacent to the linear antennas for creating a magnetic field perpendicularly crossing an electric field created by the linear antennas in such a manner that electrons perform a spiral movement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.