Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model
US7342646B2 · kind B2 · utility
16Cited by
14References
12Claims
0Family size
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Key dates
| Filing date | Jan 27, 2005 |
| Grant date | Mar 11, 2008 |
| Priority date | — |
| Expiry date | May 19, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for modeling a photolithography process which includes the steps of generating a calibrated model of the photolithography process capable of estimating an image to be produced by the photolithography process when utilized to image a mask pattern containing a plurality features; and determining an operational window of the calibrated model, which defines whether or not the calibrated model can accurately estimate the image to be produced by a given feature in the mask pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.