Lithographic alignment system and device manufacturing method
US7345739B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Mar 5, 2004 |
| Grant date | Mar 18, 2008 |
| Priority date | — |
| Expiry date | Oct 10, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7065
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus equipped with an improved alignment system, is presented herein. In one embodiment, the apparatus includes a radiation system for providing a projection beam of radiation, a support structure for supporting a patterning device that configures the projection beam according to a desired pattern, a substrate holder for holding a substrate, projection system for projecting the patterned beam onto a target portion of the substrate, and an alignment system. The alignment system includes a radiation source for illuminating at least one mark which is usable for alignment on a substrate and an imaging system for imaging light which has interacted with the at least one mark to generate alignment information.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.