Control of beam spot size in ellipsometer and the like systems
US7345762B1 · kind B1 · utility
7Cited by
71References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 15, 2005 |
| Grant date | Mar 18, 2008 |
| Priority date | — |
| Expiry date | Aug 4, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/21
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed are system for and method of analyzing substantially the exact same spot size on a sample system with at least two wavelengths for which the focal lengths do not vary more than within an acceptable amount.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.