Immersion exposure technique
US7349064B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 22, 2004 |
| Grant date | Mar 25, 2008 |
| Priority date | — |
| Expiry date | Sep 16, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus having a projection optical system configured to project a pattern of an original to a substrate and exposing a substrate to light via the original with a gap between the substrate and the projection optical system being filled with liquid. The apparatus includes a substrate stage configured to hold the substrate and to move, a supply nozzle configured to supply the liquid to the gap between the substrate and the projection optical system, the supply nozzle entirely surrounding the projection optical system, and a recovery nozzle arranged outside the supply nozzle and configured to recover the liquid from the gap, the recovery nozzle entirely surrounding said supply nozzle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.