Lithographic apparatus and positioning apparatus
US7349069B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 20, 2005 |
| Grant date | Mar 25, 2008 |
| Priority date | — |
| Expiry date | Jul 21, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70775
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus comprises a substrate table to hold a substrate, a reference structure and a measurement system to measure a position of the substrate table with respect to the reference structure. The measurement system comprises a first measurement system to measure a position of the substrate table with respect to an intermediate structure and a second measurement system to measure a position of the intermediate structure with respect to the reference structure. The intermediate structure may be connected or connectable to a drive mechanism to drive the substrate table. A distance between the substrate table and the intermediate structure, resp. a distance between the intermediate structure and the reference structure may be small which results in a highly accurate position measurement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.