Fused silica pellicle in intimate contact with the surface of a photomask
US7351503B2 · kind B2 · utility
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42References
25Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 11, 2003 |
| Grant date | Apr 1, 2008 |
| Priority date | — |
| Expiry date | Aug 6, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/62
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle is to be intimately secured to the patterned surface of a photomask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.