Method and relative test structure for measuring the coupling capacitance between two interconnect lines
US7352192B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 30, 2004 |
| Grant date | Apr 1, 2008 |
| Priority date | — |
| Expiry date | Jul 4, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/58
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and a relative test structure for measuring the coupling capacitance between two interconnect lines exploits the so-called cross-talk effect and keeps an interconnect line at a constant reference voltage. This approach addresses the problem of short-circuit currents that affect known test structures, and allows a direct measurement of the coupling capacitance between the two interconnect lines. Capacitance measurements may also be used for determining points of interruption of interconnect lines. When a line is interrupted, the measured coupling capacitance is the capacitance of a single conducting branch. The position of points of interruption of an interconnect line is determined by measuring the coupling capacitance of all segments of the line with a second conducting line.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.