Mask and apparatus using it to prepare sample by ion milling
US7354500B2 · kind B2 · utility
11Cited by
7References
3Claims
0Family size
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Key dates
| Filing date | Aug 20, 2004 |
| Grant date | Apr 8, 2008 |
| Priority date | — |
| Expiry date | Jun 5, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N1/32
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A mask for use with a sample preparation apparatus that prepares an ion-milled sample adapted to be observed by an electron microscope is offered. It is possible to prepare the sample having a desired cross section by the use of the mask. The mask, which defines the boundary between irradiated and unirradiated regions on the sample surface, has an edge portion having an increased thickness compared with the other portions. When the edge portion of the mask is etched, the original shape is almost maintained. Thus, the side surface of the mask is kept on the center axis of the ion beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.