Imaging system, in particular for a microlithographic projection exposure apparatus
US7359036B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 26, 2006 |
| Grant date | Apr 15, 2008 |
| Priority date | — |
| Expiry date | May 26, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention concerns imaging systems, in particular for a microlithographic projection exposure apparatus, for imaging a mask which can be positioned in an object plane of the imaging system on to a photosensitive layer which can be positioned in an image plane of the imaging system. An imaging system according to the invention comprises: an object plane-side subsystem which produces a first intermediate image with an object plane-side imaging scale βo, at least one further subsystem which produces a further intermediate image between the first intermediate image and the image plane, and an image plane-side subsystem which images the further intermediate image into the image plane with an image plane-side imaging scale βi, wherein the condition 0.75≦βo*βi≦1.25 is satisfied.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.