Aurelian Dodoc
68Patents
11h-index
63Co-inventors
77Inventor score
Filing activity: Oct 22, 2003 → Mar 15, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7187503B2 | Refractive projection objective for immersion lithography | Physics | 39 | Expired |
| US7385756B2 | Catadioptric projection objective | Physics | 35 | Expired |
| US6995930B2 | Catadioptric projection objective with geometric beam splitting | Physics | 23 | Expired |
| US7359036B2 | Imaging system, in particular for a microlithographic projection exposure apparatus | Physics | 19 | Expired |
| US7136220B2 | Catadioptric reduction lens | Physics | 18 | Expired |
| US7203010B2 | Catadioptric projection objective | Physics | 16 | Expired |
| US7463422B2 | Projection exposure apparatus | Physics | 16 | Active |
| US7532306B2 | Microlithographic projection exposure apparatus | Physics | 16 | Expired |
| US7239450B2 | Method of determining lens materials for a projection exposure apparatus | Physics | 16 | Expired |
| US8107162B2 | Catadioptric projection objective with intermediate images | Physics | 14 | Active |
| US7426082B2 | Catadioptric projection objective with geometric beam splitting | Physics | 14 | Expired |
| US7712905B2 | Imaging system with mirror group | Physics | 9 | Active |
| US7697198B2 | Catadioptric projection objective | Physics | 8 | Expired |
| US8208199B2 | Catadioptric projection objective | Physics | 7 | Active |
| US7570343B2 | Microlithographic projection exposure apparatus | Physics | 7 | Expired |
| US8208198B2 | Catadioptric projection objective | Physics | 6 | Active |
| US7869122B2 | Catadioptric projection objective | Physics | 4 | Active |
| US7920338B2 | Reduction projection objective and projection exposure apparatus including the same | Physics | 4 | Active |
| US8031326B2 | Illumination system or projection lens of a microlithographic exposure system | Physics | 3 | Active |
| US7277231B2 | Projection objective of a microlithographic exposure apparatus | Physics | 3 | Expired |
| US7751129B2 | Refractive projection objective for immersion lithography | Physics | 2 | Expired |
| US8858099B2 | Anamorphic objective | Physics | 2 | Active |
| US7551361B2 | Lithography lens system and projection exposure system provided with at least one lithography lens system of this type | Physics | 1 | Expired |
| US7835073B2 | Projection objective for lithography | Physics | 1 | Active |
| US8212991B2 | Optical system of a microlithographic projection exposure apparatus | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.