Method of preparing a chiral substrate surface by electrodeposition
US7361261B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 2, 2004 |
| Grant date | Apr 22, 2008 |
| Priority date | — |
| Expiry date | Mar 19, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25B3/23
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A solid substrate comprising a surface comprising an achiral array of atoms having thereupon a chiral metal oxide surface. The chiral metal oxide surface is prepared by electrodeposition of a chiral metal oxide array from a solution of a chiral salt of the metal. In one embodiment, chiral CuO is grown on achiral Au(001) by epitaxial electrodeposition. The handedness of the film is determined by the specific enantiomer of tartrate ion in the deposition solution. (R,R)-tartrate produces an S—CuO(1 1 1) film, while (S,S)-tartrate produces an R—CuO( 11 1) film. These chiral CuO films are enantiospecific for the electrochemical oxidation of(R,R) and (S,S)-tartrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.