Compositions for dark-field polymerization and method of using the same for imprint lithography processes
US7365103B2 · kind B2 · utility
29Cited by
59References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 12, 2002 |
| Grant date | Apr 29, 2008 |
| Priority date | — |
| Expiry date | Feb 28, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A composition is provided and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization is disclosed. The composition includes a polymerizable bisvinylether and an initiator that produces an acid in response to radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.