Pattern recognition system
US7368745B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 27, 2003 |
| Grant date | May 6, 2008 |
| Priority date | — |
| Expiry date | Nov 10, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S3/7867
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A star pattern recognition system (1) comprises an optical filter arrangement (10) in the form of an array (12) of independently tiltable mirrors (M1), (M2). Light from a distant starfield (2) is incident upon the mirror array (12). Each mirror (M1), (M2) reflects a respective image of the starfield, and these images are brought to a common overlapping focus at a detector (18) by a parabolic mirror (14). The mirrors M1, M2 are tilted relative to each other such that when a given star pattern to be recognised is present in the field of view of the filter, each mirror reflects the image of a different star in the pattern onto a common point on a detector (18), thereby providing a detectable output intensity peak that indicates the presence of the star pattern in the field of view of the filter arrangement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.