System and method for measuring dimension of patterns formed on photomask
US7369254B2 · kind B2 · utility
1Cited by
5References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 13, 2005 |
| Grant date | May 6, 2008 |
| Priority date | — |
| Expiry date | Jan 27, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for measuring dimension of photomasks comprises a light source emitting measuring light having a wavelength, a transmission detector for receiving the measuring light, a stage on which a photomask having circuit patterns is placed, the stage being disposed between the light source and the transmission detector, and a controller having a dimension-deciding algorithm to determine a dimension of the circuit patterns from a spectroscopic characteristic of the received measuring light, the controller being connected to the transmission detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.