Seong-woon Choi
28Patents
5h-index
58Co-inventors
68Inventor score
Filing activity: Aug 5, 2002 → Feb 28, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8039196B2 | Method of forming fine patterns using a block copolymer | Performing Operations; Transporting | 66 | Active |
| US7001697B2 | Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomask | Physics | 22 | Expired |
| US6835507B2 | Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare | Physics | 8 | Expired |
| US8338310B2 | Method of forming line/space patterns | Electricity | 8 | Active |
| US8392854B2 | Method of manufacturing semiconductor device by using uniform optical proximity correction | Emerging Cross-Sectional Technologies | 7 | Active |
| US8399174B2 | Method of forming fine patterns using a block copolymer | Performing Operations; Transporting | 5 | Active |
| US7560198B2 | Photo-mask having exposure blocking region and methods of designing and fabricating the same | Physics | 5 | Active |
| US6866968B2 | Photomask for off-axis illumination and method of fabricating the same | Physics | 5 | Expired |
| US8173358B2 | Method of forming fine patterns of a semiconductor device | Emerging Cross-Sectional Technologies | 4 | Active |
| US7527901B2 | Method of repairing phase shift mask | Physics | 3 | Active |
| US8227349B2 | Method of forming a mask pattern, method of forming a minute pattern, and method of manufacturing a semiconductor device using the same | Electricity | 3 | Active |
| US8263487B2 | Method of forming patterns of semiconductor device | Electricity | 3 | Active |
| US7389491B2 | Methods, systems and computer program products for correcting photomask using aerial images and boundary regions | Physics | 3 | Active |
| US7521156B2 | Photo mask and method of correcting the transmissivity of a photo mask | Physics | 2 | Active |
| US8510684B2 | Method of forming a photomask layout using optical proximity correction to compensate for a three-dimensional mask effect | Physics | 2 | Active |
| US7601467B2 | Method of manufacturing EUVL alternating phase-shift mask | Physics | 2 | Active |
| US7393615B2 | Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare | Physics | 1 | Active |
| US7070891B2 | Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation | Physics | 1 | Expired |
| US7369254B2 | System and method for measuring dimension of patterns formed on photomask | Physics | 1 | Expired |
| US8689150B2 | Method of fabricating semiconductor device | Physics | 1 | Active |
| US7465524B2 | Photomask and method of controlling transmittance and phase of light using the photomask | Physics | 1 | Active |
| US7065735B2 | Method for making an OPC mask and an OPC mask manufactured using the same | Electricity | 1 | Expired |
| US8341561B2 | Methods of arranging mask patterns and associated apparatus | Physics | 1 | Active |
| US7341809B2 | Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation | Physics | 0 | Expired |
| US8536347B2 | Photoacid generator, chemically amplified resist composition including the same, and associated methods | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.