Method and apparatus for removing a halogen-containing residue
US7374696B2 · kind B2 · utility
1Cited by
10References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 11, 2004 |
| Grant date | May 20, 2008 |
| Priority date | — |
| Expiry date | Jan 16, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31116
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The invention provides for a method and integrated system for removing a halogen-containing residue from a substrate comprising etching the substrate, heating the substrate and exposing the heated substrate to a plasma that removes the halogen-containing residue.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.