Active reactant vapor pulse monitoring in a chemical reactor
US7374941B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 31, 2006 |
| Grant date | May 20, 2008 |
| Priority date | — |
| Expiry date | May 31, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus for determining changes in a supply system, designed to supply repeated pulses of a vapor phase reactant to a reaction chamber is disclosed. One embodiment involves providing the reactant source, and a gas conduit to connect the reactant source to the reaction chamber, a valve positioned in communication with the reactant source such that switching of the valve induces vapor phase reactant pulses from the reactant source to the reaction chamber and a sensor positioned in communication with the reactant source and configured to provide a signal indicative of a characteristic parameter of the reactant pulse as a function of time. A curve is derived from the signal and the shape of the curve is monitored to determine changes in the curve shape over time during subsequent pulses.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.