Electron-beam exposure system
US7375356B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 21, 2006 |
| Grant date | May 20, 2008 |
| Priority date | — |
| Expiry date | Sep 30, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31769
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron-beam exposure system includes: density-per-area map generating means configured to divide a certain area on which an electron beam is irradiated into meshes, to figure out a ratio of an area of patterns to be irradiated on each divided region to an area of the divided region, thus to generate a density-per-area map; and proximity-effect correcting means configured to correct exposure of the electron beam by referring to the density-per-area map. The proximity-effect correcting means includes: product-sum arithmetic means which is configured to perform product-sum arithmetic on two-dimensional array data, and addition means which is configured to perform addition arithmetic on the two-dimensional array data; stores, in a first memory, two-dimensional array data on the density per area of the patterns; performs the product-sum arithmetic and the addition a predetermined number of times, and thus calculates the two-dimensional array data on the density per area by a linear conversion; and uses the resultant data as two-dimensional array data on exposure to be used for correcting a proximity effect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.