Method of feedback control of ESC voltage using wafer voltage measurement at the bias supply output
US7375947B2 · kind B2 · utility
3Cited by
122References
16Claims
0Family size
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Key dates
| Filing date | Feb 7, 2007 |
| Grant date | May 20, 2008 |
| Priority date | — |
| Expiry date | Feb 7, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T279/23
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a plasma reactor having an electrostatic chuck, wafer voltage is determined from RF measurements at the bias input using previously determined constants based upon transmission line properties of the bias input, and this wafer voltage is used to accurately control the DC wafer clamping voltage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.