System for and method of gas cluster ion beam processing
US7377228B2 · kind B2 · utility
50Cited by
8References
23Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 19, 2003 |
| Grant date | May 27, 2008 |
| Priority date | — |
| Expiry date | Oct 17, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0812
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
System and method of gas-cluster ion beam processing is realized by incorporating improved beam and workpiece neutralizing components. Larger GCIB current transport is enabled by low energy electron neutralization of space charge of the GCIB. The larger currents transport greater quantities of gas in the GCIB. A vented faraday cup beam measurement system maintains beam dosimetry accuracy despite the high gas transport load.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.