Patent · US Expired

Composition and method for removing copper-compatible resist

US7384900B2 · kind B2 · utility

10Cited by
5References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 25, 2004
Grant dateJun 10, 2008
Priority date
Expiry dateSep 25, 2025

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC11D2111/22
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

A composition for removing a copper-compatible resist includes about 10 to 30% by weight of an amine compound solvent, the amine compound solvent including an alkanol amine, about 10 to 80% by weight of a glycol group solvent, about 9.5 to 80% by weight of a polar solvent, and about 0.5 to 10% by weight of a corrosion inhibitor.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.