Composition and method for removing copper-compatible resist
US7384900B2 · kind B2 · utility
10Cited by
5References
5Claims
0Family size
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Key dates
| Filing date | Aug 25, 2004 |
| Grant date | Jun 10, 2008 |
| Priority date | — |
| Expiry date | Sep 25, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A composition for removing a copper-compatible resist includes about 10 to 30% by weight of an amine compound solvent, the amine compound solvent including an alkanol amine, about 10 to 80% by weight of a glycol group solvent, about 9.5 to 80% by weight of a polar solvent, and about 0.5 to 10% by weight of a corrosion inhibitor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.