Exposure apparatus and device manufacturing method
US7385674B2 · kind B2 · utility
17Cited by
12References
54Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 10, 2005 |
| Grant date | Jun 10, 2008 |
| Priority date | — |
| Expiry date | Nov 10, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/707
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus in which by filling at least a portion between a projection optical system and a substrate with a liquid and by projecting an image of a pattern onto the substrate via said projection optical system and said liquid, said substrate is exposed, said exposure apparatus includes: a substrate holding member that holds said substrate and keeps liquid so that said substrate is immersed in the liquid; and a liquid supply mechanism that supplies, at a vicinity of the projection area of said projection optical system, liquid onto said substrate from above said substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.