Method and apparatus for inspecting substrate pattern
US7385689B2 · kind B2 · utility
3Cited by
5References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 22, 2005 |
| Grant date | Jun 10, 2008 |
| Priority date | — |
| Expiry date | Aug 10, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/95615
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of inspecting an inspection pattern using a statistical inference function is disclosed. The inference function is generated in relation to optical reference signal data and reference pattern characteristic data for a plurality of reference patterns formed by a unit process of interest on reference substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.