Support structure for free-standing MEMS device and methods for forming the same
US7385744B2 · kind B2 · utility
63Cited by
313References
44Claims
0Family size
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Key dates
| Filing date | Jun 28, 2006 |
| Grant date | Jun 10, 2008 |
| Priority date | — |
| Expiry date | Dec 5, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B3/0072
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A microelectromechanical (MEMS) device includes a functional layer including a first material and a deformable layer including a second material. The second material is different from the first material. The deformable layer is mechanically coupled to the functional layer at a junction. The functional layer and the deformable layer have substantially equal internal stresses at the junction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.