Anti-ESD photomask blank
US7387855B2 · kind B2 · utility
1Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2005 |
| Grant date | Jun 17, 2008 |
| Priority date | — |
| Expiry date | May 26, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31616
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An anti-electrostatic discharge photomask blank for fabrication of an anti-electrostatic discharge photomask is disclosed. The anti-electrostatic discharge photomask blank includes a mask substrate, a conductive layer provided on the mask substrate and an opaque patterning layer provided on the conductive layer. The conductive layer prevents charges of opposite polarity from accumulating on a photomask fabricated from the photomask blank, thus preventing electrostatic discharges on the photomask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.