Patent · US Active

Method of registering a blank substrate to a pattern generating particle beam apparatus and of correcting alignment during pattern generation

US7388213B2 · kind B2 · utility

4Cited by
5References
12Claims
0Family size

Assignee

Inventor

Key dates

Filing dateSep 23, 2005
Grant dateJun 17, 2008
Priority date—
Expiry dateMay 30, 2026

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S430/146
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

We have developed a method of registration of a particle beam to internal alignment targets present within photoresist areas which are to be imaged. The method does not affect the photoresist, so the quality of pattern produced in the resist after imaging is not affected. The method used for registration of the particle beam to internal alignment targets also can be used to align a pattern in real time, while the pattern is being created, with the internal alignment targets. The real time alignment during creation of a pattern image in the photoresist can be used to correct for drift, or thermal expansion, or gravitational sag, by way of example.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.