Lithographic apparatus and device manufacturing method
US7391499B2 · kind B2 · utility
11Cited by
16References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 2, 2004 |
| Grant date | Jun 24, 2008 |
| Priority date | — |
| Expiry date | Dec 27, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70291
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus for reducing the visibility of artifacts in the pattern is provided. The apparatus comprises an illumination system, a patterning device, a projecting system, and a modulating device. The illumination system supplies a beam of radiation. The patterning device patterns the beam. The projection system projects the beam onto a target portion of a substrate. The modulating device modulates the beam to impart the pattern with a modulation scheme.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.