System and method for efficient characterization of diffracting structures with incident plane parallel to grating lines
US7391524B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 13, 2004 |
| Grant date | Jun 24, 2008 |
| Priority date | — |
| Expiry date | Oct 25, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/4788
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and a method for optical characterization of a symmetric grating illuminated at off-normal incident angle are provided, where the plane of incidence is parallel to the grating lines. In this case corresponding positive and negative diffraction orders have the same intensity and phase. Several approaches for exploiting this symmetry are given. The first approach is a symmetric rigorous coupled wave analysis (SRCWA) adapted to the symmetric case, which accounts for N positive and N negative diffraction orders with M=N+1 space harmonics, without approximation. Various approximation methods are also given. Approximate versions of the RCWA (or SRCWA) can be developed by neglecting polarization coupling for small angles of incidence. A normal incident angle calculation can be used to approximate a situation with a small angle of incidence. Refinements to this approximation include revision of grating depth or refractive indices to improve accuracy. Methods other than the RCWA can also be symmetry simplified according to the invention.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.