Systems and methods for reducing alteration of a specimen during analysis for charged particle based and other measurement systems
US7394067B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 20, 2005 |
| Grant date | Jul 1, 2008 |
| Priority date | — |
| Expiry date | Dec 5, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Systems and methods for reducing alteration of a specimen during by charged particle based and other measurements systems are provided. One system configured to reduce alteration of a specimen during analysis includes a vacuum chamber in which the specimen is disposed during the analysis and an element disposed within the vacuum chamber. A surface of the element is cooled such that molecules in the vacuum chamber are adsorbed onto the surface and cannot cause alteration of a characteristic of the specimen during the analysis. One system configured to analyze a specimen includes an analysis subsystem configured to analyze the specimen while the specimen is disposed in a vacuum chamber and an element disposed within the vacuum chamber. A surface of the element is cooled such that molecules in the vacuum chamber are adsorbed onto the surface and cannot cause alteration of a characteristic of the specimen during the analysis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.