Methods and apparatus for ion beam angle measurement in two dimensions
US7394073B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 20, 2006 |
| Grant date | Jul 1, 2008 |
| Priority date | — |
| Expiry date | Oct 25, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31703
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An angle measurement system for an ion beam includes a flag defining first and second features, wherein the second feature has a variable spacing from the first feature, a mechanism to translate the flag along a translation path so that the flag intercepts at least a portion of the ion beam, and a sensing device to detect the ion beam for different flag positions along the translation path and produce a sensor signal in response to the detected ion beam. The sensor signal and corresponding positions of the flag are representative of a vertical beam angle of the ion beam in a vertical plane. The sensing device may include a mask and a mechanism to translate the mask in order to define a beam current sensor on a portion of an associated Faraday sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.