Joseph C. Olson
130Patents
11h-index
125Co-inventors
83Inventor score
Filing activity: Jun 19, 1998 → Jun 26, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6777686B2 | Control system for indirectly heated cathode ion source | Electricity | 43 | Expired |
| US7138768B2 | Indirectly heated cathode ion source | Electricity | 35 | Expired |
| US6437350B1 | Methods and apparatus for adjusting beam parallelism in ion implanters | Electricity | 29 | Expired |
| US6791094B1 | Method and apparatus for determining beam parallelism and direction | Electricity | 28 | Expired |
| US8133804B1 | Method and system for modifying patterned photoresist using multi-step ion implantation | Electricity | 16 | Active |
| US7394073B2 | Methods and apparatus for ion beam angle measurement in two dimensions | Electricity | 13 | Active |
| US9377692B2 | Electric/magnetic field guided acid diffusion | Physics | 13 | Active |
| US6075249A | Methods and apparatus for scanning and focusing an ion beam | Electricity | 12 | Expired |
| US6573518B1 | Bi mode ion implantation with non-parallel ion beams | Electricity | 11 | Expired |
| US7459704B2 | Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms | Electricity | 11 | Active |
| US6403972B1 | Methods and apparatus for alignment of ion beam systems using beam current sensors | Electricity | 11 | Expired |
| US8188445B2 | Ion source | Emerging Cross-Sectional Technologies | 11 | Active |
| US10302826B1 | Controlling etch angles by substrate rotation in angled etch tools | Electricity | 11 | Active |
| US7102139B2 | Source arc chamber for ion implanter having repeller electrode mounted to external insulator | Electricity | 9 | Expired |
| US7868305B2 | Technique for ion beam angle spread control | Electricity | 8 | Expired |
| US7276847B2 | Cathode assembly for indirectly heated cathode ion source | Electricity | 8 | Expired |
| US7655932B2 | Techniques for providing ion source feed materials | Electricity | 8 | Active |
| US7355188B2 | Technique for uniformity tuning in an ion implanter system | Electricity | 7 | Active |
| US7547460B2 | Ion implanter optimizer scan waveform retention and recovery | Electricity | 6 | Expired |
| US10823888B1 | Methods of producing slanted gratings with variable etch depths | Physics | 6 | Active |
| US10775158B2 | System and method for detecting etch depth of angled surface relief gratings | Physics | 6 | Active |
| US7663125B2 | Ion beam current uniformity monitor, ion implanter and related method | Electricity | 5 | Active |
| US6710359B2 | Methods and apparatus for scanned beam uniformity adjustment in ion implanters | Electricity | 5 | Expired |
| US7442944B2 | Ion beam implant current, spot width and position tuning | Electricity | 5 | Expired |
| US10935799B2 | Optical component having depth modulated angled gratings and method of formation | Physics | 5 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.