Lithographic apparatus and device manufacturing method
US7394521B2 · kind B2 · utility
131Cited by
24References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 23, 2003 |
| Grant date | Jul 1, 2008 |
| Priority date | — |
| Expiry date | Dec 23, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.