Optimized x-ray energy for high resolution imaging of integrated circuits structures
US7394890B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 8, 2004 |
| Grant date | Jul 1, 2008 |
| Priority date | — |
| Expiry date | Jan 5, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2207/005
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
An x-ray imaging system uses particular emission lines that are optimized for imaging specific metallic structures in a semiconductor integrated circuit structures and optimized for the use with specific optical elements and scintillator materials. Such a system is distinguished from currently-existing x-ray imaging systems that primarily use the integral of all emission lines and the broad Bremstralung radiation. The disclosed system provides favorable imaging characteristics such as ability to enhance the contrast of certain materials in a sample, to use different contrast mechanisms in a single imaging system, and to increase the throughput of the system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.