Patent · US Active

Process for removing particles from reticle

US7396418B2 · kind B2 · utility

0Cited by
1References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 11, 2007
Grant dateJul 8, 2008
Priority date
Expiry dateMay 19, 2027

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F1/66
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A process for removing particles from a reticle is described, wherein the process is performed by using a pellicle particle detector (PPD) and a particle removing tool disposed in front of the PPD as well as fixed to the PPD. The particle removing tool includes at least one gas spray member directed toward a surface of the reticle for removing particles. The process includes steps as follows, step (a) loading the reticle into the PPD through the gas spray member to detect whether the reticle has particles thereon; step (b) ejecting the reticle from the PPD; step (c) turning on the particle removing tool as well as going back to step (a) when particles are detected on the reticle, and ending the particle removal process when no particle is detected on the reticle.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.