Photomask reticle having multiple versions of the same mask pattern with different biases
US7396617B2 · kind B2 · utility
3Cited by
37References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 14, 2004 |
| Grant date | Jul 8, 2008 |
| Priority date | — |
| Expiry date | Mar 26, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reticle includes at least two duplicate mask patterns each having a different bias. A reticle according to at least one embodiment of the invention includes a first mask pattern, a second mask pattern and a third mask pattern, each of the first mask pattern, second mask pattern and third mask pattern being duplicates of one another and having a different bias.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.