Lithographic apparatus, contaminant trap, and device manufacturing method

US7397056B2 · kind B2 · utility

Assignee

• ASML NETHERLANDS B.V. · NL

Inventors

• Leonid Aizikovitch Sjmaenok · Vaals, NL
• Vadim Yevgenyevich Banine · Deurne, NL
• Josephus Jacobus Smits · Geldrop, NL
• Lambertus Adrianus Van De Wildenberg · Geldrop, NL
• Alexander Schmidt · Ingolstadt, DE
• Arnoud Cornelis Wassink · Veldhoven, NL
• Eric Louis Willem Verpalen · Geldrop, NL
• Antonius Johannes Van De Pas · Veldhoven, NL

Key dates

• Filing date: Jul 6, 2005
• Grant date: Jul 8, 2008
• Expiry date: May 10, 2026

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70916
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.