Lithographic apparatus and device manufacturing method
US7397533B2 · kind B2 · utility
13Cited by
23References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 7, 2004 |
| Grant date | Jul 8, 2008 |
| Priority date | — |
| Expiry date | Jul 19, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70808
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with a substrate table configured to hold the substrate in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.