Exposure apparatus and device manufacturing method
US7397534B2 · kind B2 · utility
2Cited by
13References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 23, 2005 |
| Grant date | Jul 8, 2008 |
| Priority date | — |
| Expiry date | Nov 23, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The exposure system comprises a projection optical system that irradiates exposure light emitted from a mask onto a substrate, a first support member that supports the projection optical system, and a support structure that supports the first support member, wherein the support member supports the first support member at a position that is higher than the position at which the first support member supports the projection optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.