Baking device and baking method of baking a chemically amplified resist film containing an acid (H+) generator before exposure but after development
US7402782B2 · kind B2 · utility
9Cited by
3References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 4, 2005 |
| Grant date | Jul 22, 2008 |
| Priority date | — |
| Expiry date | Aug 15, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/38
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A heat treatment device for baking a chemically amplified resist film formed on a substrate after exposure but before development includes a table that supports the substrate, a heater that heats the substrate, a magnetic field generating unit that generates a magnetic field of lines of magnetic flux directed in a film thickness direction of the resist film and reverses the direction of the lines of magnetic flux, and a controller unit that controls the magnetic field generating unit to generate the magnetic field acting on the resist film at least while the substrate is being heated by the heater unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.