Electron injection in ion implanter magnets
US7402816B2 · kind B2 · utility
3Cited by
11References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 17, 2005 |
| Grant date | Jul 22, 2008 |
| Priority date | — |
| Expiry date | Oct 8, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/057
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
One or more electron sources are utilized to inject electrons into an ion beam being transported between the polepieces of a magnet. In some embodiments, the electron sources are located in cavities in one or both polepieces of the magnet. In other embodiments, a radio frequency or microwave plasma flood gun is located in a cavity in at least one of the polepieces or between the polepieces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.