LPP EUV drive laser input system

US7402825B2 · kind B2 · utility

Assignee

• Cymer, LLC · US

Inventors

• Rodney D. Simmons · San Diego, US
• John Viatella · San Diego, US
• Jerzy Hoffman · Santa Monica, US
• R. Kyle Webb · Escondido, US
• Alexander N. Bykanov · San Diego, US
• Oleh Khodykin · San Diego, US

Key dates

• Filing date: Jun 28, 2005
• Grant date: Jul 22, 2008
• Expiry date: Jan 16, 2027

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05G2/0094
• WIPO field: Medical technology
• WIPO sector: Instruments

Abstract

A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages. The laser passage aperture may define an opening large enough to let the drive laser beam pass without attenuation and small enough to substantially reduce debris passing through the laser passage aperture in the direction of the entrance window.