Lithographic apparatus and device manufacturing method
US7403261B2 · kind B2 · utility
10Cited by
17References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 15, 2004 |
| Grant date | Jul 22, 2008 |
| Priority date | — |
| Expiry date | Apr 17, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.