method for generating a set of test patterns for an optical proximity correction algorithm
US7404174B2 · kind B2 · utility
5Cited by
1References
7Claims
0Family size
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Key dates
| Filing date | Jul 27, 2004 |
| Grant date | Jul 22, 2008 |
| Priority date | — |
| Expiry date | Sep 26, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of synthesizing layout patterns to test an optical proximity correction algorithm. The method comprises the steps of: embodying Walsh patterns in a set of Walsh pattern matrices; processing groups of matrices from the set of Walsh pattern matrices to form a set of test matrices; mapping the set of test matrices to a test pattern set.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.