Large field of view 2X magnification projection optical system for FPD manufacture
US7405802B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 19, 2004 |
| Grant date | Jul 29, 2008 |
| Priority date | — |
| Expiry date | Oct 31, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70791
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification reflective optical system images the reticle onto the substrate. The system may be a 2× magnification system, or another magnification that is compatible with currently available mask sizes. By writing reticles with circuit pattern dimensions that are one-half the desired size for an FPD, a 2× optical system can be used to expose FPDs. The designs for the 1.5× and larger magnification optical systems all typically have at least three powered mirrors. A corrector, positioned either near the reticle or near the substrate, can be added to the three mirror design to improve the systems optical performance. The corrector may be a reflective, or a refractive design. The corrector can have an aspheric surface, and optionally a powered surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.