Sulfonamide compound, polymer compound, resist material and pattern formation method
US7413843B2 · kind B2 · utility
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15References
7Claims
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Key dates
| Filing date | Dec 20, 2006 |
| Grant date | Aug 19, 2008 |
| Priority date | — |
| Expiry date | Dec 20, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.